Photolithography Modeling Software
Training is usually given one-on-one to interested users. Group sessions are scheduled on request. KLA-Tencor's software licensing sponsorship requires that PROLITH by KLA-Tencor be ONLY available to academic users of CNF. Please contact Garry Bordonaro for training. |
Description:
Projection Lithography simulation software for prediction of printed patterns in photoresist. Includes interactions of light sources, optics, photoresist and film stack, as well as processing parameters.
Capabilities:
EUV, 193nm, 248nm, i-line, and g-line sources, conventional and shaped illumination, polarization, binary and phase shift masks, OPC, immersion, double-patterning, wafer topology, etch results, GDS-II import/export, result file/graphic export.
Processes Available:
Swing curve, Bosung curve, 2D resist profile, 3D resist profile, dose to clear, dose to print, OPC, flare, Zernike aberrations.
Applications:
Prediction of swing curve, process parameters, resist profile, pattern shape, mask design, stepper optimization.
Documentation:
PROLITH by KLA-Tencor Product Page
PROLITH by KLA-Tencor Training Document