Photolithography Modeling Software

Training is available through CULearn... sign up for course:

RSRCH - CNF - PROLITH Video Training

In-person assistance may be give one-on-one to interested users by request. Group sessions may also be scheduled on request.

KLA-Tencor's software licensing sponsorship requires that PROLITH by KLA-Tencor be ONLY available to academic users of CNF.

Description:

Projection Lithography simulation software for prediction of printed patterns in photoresist. Includes interactions of light sources, optics, photoresist and film stack, as well as processing parameters.

Capabilities:

EUV, 193nm, 248nm, i-line, and g-line sources, conventional and shaped illumination, polarization, binary and phase shift masks, OPC, immersion, double-patterning, wafer topology, etch results, GDS-II import/export, result file/graphic export.

Processes Available:

Swing curve, Bosung curve, 2D resist profile, 3D resist profile, dose to clear, dose to print, OPC, flare, Zernike aberrations.

Applications:

Prediction of swing curve, process parameters, resist profile, pattern shape, mask design, stepper optimization.

Documentation:

PROLITH by KLA-Tencor Product Page
PROLITH by KLA-Tencor Training Document

  • No labels