Photolithography Modeling Software
Training is available through CULearn... sign up for course:
RSRCH - CNF - PROLITH Video Training
In-person assistance may be give one-on-one to interested users by request. Group sessions may also be scheduled on request.
KLA-Tencor's software licensing sponsorship requires that PROLITH by KLA-Tencor be ONLY available to academic users of CNF.
Projection Lithography simulation software for prediction of printed patterns in photoresist. Includes interactions of light sources, optics, photoresist and film stack, as well as processing parameters.
EUV, 193nm, 248nm, i-line, and g-line sources, conventional and shaped illumination, polarization, binary and phase shift masks, OPC, immersion, double-patterning, wafer topology, etch results, GDS-II import/export, result file/graphic export.
Swing curve, Bosung curve, 2D resist profile, 3D resist profile, dose to clear, dose to print, OPC, flare, Zernike aberrations.
Prediction of swing curve, process parameters, resist profile, pattern shape, mask design, stepper optimization.