E-beam Pattern Conversion and Proximity Correction
Equipment Training Layout BEAMER training is part of the General Electron Beam Lithography Training. See http://www.cnfusers.cornell.edu/cnf5_tool.taf?_function=detail&eq_id=193 |
Description:
The preparation of large layout data for e-beam direct write requires a highly efficient, flexible and robust framework for design and execution of complex processes including layout handling, processing, PEC, process modeling & correction, inspection and conversion to the machine format. Layout BEAMER is a highly intuitive, process flow driven layout processing solution.
Capabilities:
- VisualFLOWTM graphical user interface for drag & drop design of process flows
- Import of layouts in different formats
- Layout Viewer
- Extraction of cells, layers or regions of interest
- Export to different formats
Layout operation (e.g. healing, tone-reversal, bias, Boolean functions)
- E-Beam Proximity Effect Correction
- Output formatter for different E-Beam machines
Documentation: