E-beam Pattern Conversion and Proximity Correction

Equipment Training
Layout BEAMER training is part of the General Electron Beam Lithography Training. See http://www.cnfusers.cornell.edu/cnf5_tool.taf?_function=detail&eq_id=193

Description:

The preparation of large layout data for e-beam direct write requires a highly efficient, flexible and robust framework for design and execution of complex processes including layout handling, processing, PEC, process modeling & correction, inspection and conversion to the machine format. Layout BEAMER is a highly intuitive, process flow driven layout processing solution.

Capabilities:

Documentation: