Table of Contents:
Processes Available on the Oxford ALD FlexAL
- Al2O3: plasma & thermal
- AlN: plasma
- HfO2: plasma & thermal
- HfN: plasma & PEALD
- HfAlOx: plasma
- HfSiOx: plasma
- HfSiON: plasma
- SiO2: plasma & PEALD
- TaN: plasma (H2) & thermal
- TaOx: plasma & PEALD & thermal
Manuals and Guides
Supplementary Files
- Devlopment of a Stress-Free Polysilicon Deposition and Annealing Process
SOURCE: (CNF website)
DATE: 8/13/2009