Table of Contents:
Processes Available on the Oxford ALD FlexAL
Al2O3: plasma & thermal
AlN: plasma
HfO2: plasma & thermal
HfN: plasma & PEALD
HfAlOx: plasma
HfSiOx: plasma
HfSiON: plasma
SiO2: plasma & PEALD
TaN: plasma (H2) & thermal
TaOx: plasma & PEALD & thermal
Manuals and Guides
Slides from 2010 TCN
Supplementary Files
TaN plasma characterization
SOURCE: (AFS: Fellows)
DATE: 1/24/2013
Devlopment of a Stress-Free Polysilicon Deposition and Annealing Process
SOURCE: (CNF website)
DATE: 8/13/2009
Ta2O5 (TaOx) plasma characterization
SOURCE: (AFS: Fellows)
DATE: 1/15/2013