L-Edit Layout Editor software by Mentor Graphics
Computer Aided Design Training with L-Edit software is conducted via Zoom. Please e-mail ledit-training@cnf.cornell.edu to request training. Training is usually taught by Alan Bleier or Karlis Musa. |
Description:
L-Edit is a layout editor for photolithography, electron beam lithography, or dot-matrix printing. It runs on Windows computers in the CNF CAD room, the cleanroom, and 2nd floor labs.
L-Edit is used to design devices and produce intermediate files in an industry-standard format.
For the dot-matrix printer the intermediate format is CIF, and the copy of L-Edit in the dot-matrix printer lab must be used to export the file to CIF format.
For electron beam lithography and photolithography the intermediate file format is GDSII.
Contact managers of each e beam or mask making tool to learn how to convert from GDSII to the native file format for that tool. The e beam tools are the JEOL 6300FS and the JEOL 9500FSZ. The mask makers are the Mann 3600 optical pattern generator and the Heidelberg DWL66 laser pattern generator.
Capabilities:
Large, useful manual available from Help menu
Boolean and derived layer operations; subtract, grow and shrink on groups of objects
Design navigator for easy traversal of design hierarchy
Area calculator (in Tools -> Add-Ins)
Cross-section viewer to simulate a set of simplified process steps and visualize vertical structure of a device
Support for parameterized cells called T-Cells
User-programmable interface (UPI) with C/C++ syntax
Documentation:
- Tanner EDA L-Edit Layout Editor web site
- Handout and quick reference for CAD at CNF using L-Edit
- Using L-Edit v2020