GenISys Layout BEAMER

E-beam Pattern Conversion and Proximity Correction

Equipment Training
Layout BEAMER training is part of the General Electron Beam Lithography Training. See CNF Lab Users Electron-Beam Lithography page for details on trainings.

Description:

The preparation of large layout data for e-beam direct write requires a highly efficient, flexible and robust framework for design and execution of complex processes including layout handling, processing, PEC, process modeling & correction, inspection and conversion to the machine format. Layout BEAMER is a highly intuitive, process flow driven layout processing solution.

Capabilities:

VisualFLOWTM graphical user interface for drag & drop design of process flows
Import of layouts in different formats
Layout Viewer
Extraction of cells, layers or regions of interest
Export to different formats
Layout operation (e.g. healing, tone-reversal, bias, Boolean functions)
E-Beam Proximity Effect Correction
Output formatter for different E-Beam machines

Large Beamer Flows:

If you are processing a large BEAMER design, you may need more resources than those available on the physical CNF conversion computers. We have you covered – BEAMER can be run in the cloud on AWS for low hourly rates.

Documentation:

Invoking Beamer:

On the CNF conversion computers, the current version of GenISys Beamer can be invoked with any of the following commands (don't type in the dollar sign, that is the command prompt):

$ LayoutBeamer
or
$ LayoutBEAMER
or
$ LayoutBeamer.csh

A previous version of GenISys Beamer may be available in case of bugs found in the most recently installed version. Invoke the previous version of Beamer with the following command:

$ beamer-previous

Occassionally, CNF will beta-test a new version of GenISys Beamer. If available, the developmental test version of Beamer may be invoked with the following command:

$ beamer-devel

Page tree