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Photolithography Modeling Software

Training is usually given one-on-one to interested users. Group sessions are scheduled on request. KLA-Tencor's software licensing sponsorship requires that PROLITH by KLA-Tencor be ONLY available to academic users of CNF.

 


Please contact Garry Bordonaro for training.

Description:

Projection Lithography simulation software for prediction of printed patterns in photoresist. Includes interactions of light sources, optics, photoresist and film stack, as well as processing parameters.

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Prediction of swing curve, process parameters, resist profile, pattern shape, mask design, stepper optimization.

Documentation:

Getting Getting Started
PROLITH by KLA-Tencor
PROLITH by KLA-Tencor Product Page
PROLITH by KLA-Tencor Training Document