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If User publishes any papers, abstracts, or similar publications, User will acknowledge PROLITH and/or/KLA products in use by USER, in any an all such papers, abstracts, or similar publications that may result from the use of the (Prolith) Software. User shall also identify "PROLITH by KLA" as a sponsor on its group web pages.
KLA requests that user cite the "PROLITH by KLA" product page.
Capabilities:
EUV, 193nm, 248nm, i-line, and g-line sources, conventional and shaped illumination, polarization, binary and phase shift masks, OPC, immersion, double-patterning, wafer topology, etch results, GDS-II import/export, result file/graphic export.
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