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- Al2O3: plasma & thermal
- AlN: plasma
- HfO2: plasma & thermal
- HfN: plasma & PEALD
- HfAlOx: plasma
- HfSiOx: plasma
- HfSiON: plasma
- SiO2: plasma & PEALD
- TaN: plasma (H2) & thermal
- TaOx: plasma & PEALD & thermal
Processes Available on the Arradiance GEMStar
- Thermal Al2O3
- Thermal TiO2
- Thermal HfO2
- Thermal ZrO2
- Thermal HfZrO2 (piezoelectric HZO)
- Thermal Pt
Processes Available on the Veeco Savannah
- Thermal Al2O3
- Thermal Pt (O2 or O3)
- Thermal Ru
Manuals and Guides
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Supplementary Files
- TaN plasma characterization
SOURCE: (AFS: Fellows)
DATE: 1/24/2013Devlopment of a Stress-Free Polysilicon Deposition and Annealing ProcessSOURCE: (CNF website)
DATE: 8/13/2009 - A streamlined approach to particle ALD coating of spherical beads
SOURCE: Fellows
DATE: 11/23/2016