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Projection Lithography simulation software for prediction of printed patterns in photoresist. Includes interactions of light sources, optics, photoresist and film stack, as well as processing parameters.
Academic Research Use Only:
PROLITH is available for academic research use only. Users with both industrial and academic research projects must only use this software for the academic research projects.
User may not use the Software for any activity which is a work for hire or performed under contract to conduct proprietary research or create proprietary work product for government agencies or private, commercial enterprises
Capabilities:
EUV, 193nm, 248nm, i-line, and g-line sources, conventional and shaped illumination, polarization, binary and phase shift masks, OPC, immersion, double-patterning, wafer topology, etch results, GDS-II import/export, result file/graphic export.
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