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[7]    J. Kim, et al., “Directed self-assembly of block copolymers for next generation nanolithography,” Mater. Today, 16 (12), 2013, pp 468-476.

[8]    C. Bates, et al., “Block Copolymer Lithography,” Macromolecules, 2014, 47 (1), pp 2-12.

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