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For general reading about BCPs, I suggest [81].
References
[1] C. Bates, et al., “Block Copolymer Lithography,” Macromolecules, 2014, 47 (1), pp 2-12.
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[5] N. Lynda, A. J. Meuler, M. A. Hillmyer, “Polydispersity and block copolymer self-assembly,” Prog. Polym. Sci., 33 (9), 2008, pp. 875-893.
[6] Yushu Y. Matsushita, et al., “Molecular Weight Dependence of Lamellar Domain Spacing of Diblock Copolymers in Bulk,” Macromolecules, 1990, 23 (19), pp 4313-4316.
[7] J. Kim, et al., “Directed self-assembly of block copolymers for next generation nanolithography,” Mater. Today, 16 (12), 2013, pp 468-476.[8] C. Bates, et al., “Block Copolymer Lithography,” Macromolecules, 2014, 47 (1), pp 2-12.
Upcoming: PS-b-PDMS for <10nm lines and pillars!
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