| Table of Contents |
|---|
...
Alex Alexander Ruyack, CNF Fellow - Jan. 2017 - Parts re-purposed from 2017 issue of the Nanometer
...
Introduction
Nanolithography is a fundamental requirement for the future of electronics patterning. Current trends indicate the end of Moore’s Law for traditional lithography processes. Directed self-assembly (DSA) of block copolymers (BCPs) can generate ordered, periodic arrays of various structures down to single nanometer (nm) size scale. The heterogeneous nature of these structures act intrinsically as their own mask, enabling nanometer (nm) scale resolution with a flood exposure and no traditional photo mask. BCP lithography offers low-cost processing of nm scale periodic structures typically only available by e-beam lithography, and can act as a complementary technology to conventional photolithography.
...
Below, we detail our specific work on the PS-b-PMMA BCP while also providing insights necessary for determining if BCP lithography is right for your needs, and if so, how to chose and polymer and develop a process.
If you are interested in developing a process, please contact myself or Vince Genova.
Block Copolymer Lithography Overview
...
For general reading about BCPs, I suggest [81].
References
[1] C. Bates, et al., “Block Copolymer Lithography,” Macromolecules, 2014, 47 (1), pp 2-12.
...
[5] N. Lynda, A. J. Meuler, M. A. Hillmyer, “Polydispersity and block copolymer self-assembly,” Prog. Polym. Sci., 33 (9), 2008, pp. 875-893.
[6] Yushu Y. Matsushita, et al., “Molecular Weight Dependence of Lamellar Domain Spacing of Diblock Copolymers in Bulk,” Macromolecules, 1990, 23 (19), pp 4313-4316.
[7] J. Kim, et al., “Directed self-assembly of block copolymers for next generation nanolithography,” Mater. Today, 16 (12), 2013, pp 468-476.[8] C. Bates, et al., “Block Copolymer Lithography,” Macromolecules, 2014, 47 (1), pp 2-12.
Upcoming: PS-b-PDMS for <10nm lines and pillars!