Etch Rates
SOURCE: Abdurrahman Gumus (AFS:Fellows)
DATE: 5/9/2013
SOURCE: Abdurrahman Gumus (AFS:Fellows)
DATE: 3/4/2013
User Recipes
SOURCE: (AFS:Staff)
DATE: 9/2/2011
Oxford 82 - Ar/O2 BARC etch DOE
SOURCE: (AFS:Staff)
DATE: 9/2/2011
DATE: 9/2/2011
Etching Monolayer Graphene
TOOL: Oxford 81/82
SOURCE: Melina Blees (McEuen Group)
ADDED: 2/17/13
10-minute O2 clean (standard recipe) on empty chamber. To etch graphene, use the standard oxygen clean recipe, 20-25s. Any longer and you will cake resist residue on.
Oxygen Etching of Parylene C Films
TOOL: Oxford 81
SOURCE: Ryan Badman, CNF Fellow
ADDED: 1/30/15
5 minute etch or a 10 minute etch etched about 200 nm/min of Parylene in the oxygen clean recipe
If people have thick (microns) parylene they can use 110 deg C ALD SiO2 as an etch mask since photoresist will burn too fast in the oxygen for thicker parylene (roughly same rate as parylene).
IMPORTANT NOTE: Don’t use the Anatech because the parylene film (monomer) melts at 160 deg C.