PT72 baselines
SOURCE: Abdurrahman Gumus (CNF Fellows)
ADDED: 10/9/13

 

Oxford 100, Trion, and UN770 baselines

SOURCE: Tiffany Cheng (AFS:Fellows)
DATE: 2009-2011, depending on the tool.
For the Oxford 81 and 82 and the PT72, use the newer baselines available directly from the wiki.

 

RIE etching PDMS

SOURCE: Beth Rhoades
ADDED: 12/16/13

 

Primaxx Vapor HF Etcher operating guide
SOURCE: AFS
DATE: 2/18/13

Etching Monolayer Graphene
TOOL: YES asher
SOURCE: Melina Blees (McEuen Group)
ADDED: 2/17/13

50sccm O2, 150W, 45s
Process temp: room temperature
Oxygen Etching of Parylene C Films
TOOL: PT 72
SOURCE: Ryan Badman (CNF Fellow)
ADDED: 2/2/15

O2 clean recipe etches parylene C at 150 nm/min
  • No labels