Manuals and Guides
Supplementary Files
User Recipes
SUBSTRATE: Standard 500um single-side-polished 4“ Si wafers
SOURCE: Basline etch wafer recipe from AFS:Fellows
ADDED: 2/22/13
Spin P20 at 3000 rpm for 30s. Spin Shipley 1827 resist at 3000 rpm for 30s. Softbake 115 C, 60 seconds.
Expose on the ABM 12 seconds (with 365nm and 405nm mirrors). Develop in Hamatech automated developer, using process “300 MIF 90s.”