E-beam Pattern Conversion and Proximity Correction
Equipment Training Layout BEAMER training is part of the General Electron Beam Lithography Training. See CNF Lab Users Electron-Beam Lithography page for details on trainings. |
The preparation of large layout data for e-beam direct write requires a highly efficient, flexible and robust framework for design and execution of complex processes including layout handling, processing, PEC, process modeling & correction, inspection and conversion to the machine format. Layout BEAMER is a highly intuitive, process flow driven layout processing solution.
Layout operation (e.g. healing, tone-reversal, bias, Boolean functions)
If you are processing a large BEAMER design, you may need more resources than those available on the physical CNF conversion computers. We have you covered – BEAMER can be run in the cloud on AWS for low hourly rates. CNF Computing will work with you to set up a virtual machine optimized for your jobs memory, cpu, and/or disk I/O and storage requirements.
On the CNF conversion computers, the current version of GenISys Beamer can be invoked with any of the following commands (don't type in the dollar sign, that is the command prompt):
$ LayoutBeamer or $ LayoutBEAMER or $ LayoutBeamer.csh |
A previous version of GenISys Beamer may be available in case of bugs found in the most recently installed version. Invoke the previous version of Beamer with the following command:
$ beamer-previous |
Occassionally, CNF will beta-test a new version of GenISys Beamer. If available, the developmental test version of Beamer may be invoked with the following command:
$ beamer-devel |