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E-beam Pattern Conversion and Proximity Correction

Equipment Training
Layout BEAMER training is part of the General Electron Beam Lithography Training. See http://www.cnfusers.cornell.edu/cnf5_tool.taf?_function=detail&eq_id=193

Description:

The preparation of large layout data for e-beam direct write requires a highly efficient, flexible and robust framework for design and execution of complex processes including layout handling, processing, PEC, process modeling & correction, inspection and conversion to the machine format. Layout BEAMER is a highly intuitive, process flow driven layout processing solution.

Capabilities:

VisualFLOWTM graphical user interface for drag & drop design of process flows
Import of layouts in different formats
Layout Viewer
Extraction of cells, layers or regions of interest
Export to different formats
Layout operation (e.g. healing, tone-reversal, bias, Boolean functions)
E-Beam Proximity Effect Correction
Output formatter for different E-Beam machines

Documentation:

Invoking Beamer:

On the CNF conversion computers, the current version of GenISys Beamer can be invoked with any of the following commands (don't type in the dollar sign, that is the command prompt):

$ LayoutBeamer
or
$ LayoutBEAMER
or
$ LayoutBeamer.csh

A previous version of GenISys Beamer may be available in case of bugs found in the most recently installed version. Invoke the previous version of Beamer with the following command:

$ beamer-previous

Occassionally, CNF will beta-test a new version of GenISys Beamer. If available, the developmental test version of Beamer may be invoked with the following command:

$ beamer-devel