L-Edit Layout Editor software by Mentor Graphics
Computer Aided Design Training with L-Edit software is conducted via Zoom. Please e-mail ledit-training@cnf.cornell.edu to request training. Training is usually taught by Alan Bleier or Karlis Musa. |
L-Edit is a layout editor for photolithography, electron beam lithography, or dot-matrix printing. It runs on Windows computers in the CNF CAD room, the cleanroom, and 2nd floor labs.
L-Edit is used to design devices and produce intermediate files in an industry-standard format.
For the dot-matrix printer the intermediate format is CIF, and the copy of L-Edit in the dot-matrix printer lab must be used to export the file to CIF format.
For electron beam lithography and photolithography the intermediate file format is GDSII.
Contact managers of each e beam or mask making tool to learn how to convert from GDSII to the native file format for that tool. The e beam tools are the JEOL 6300FS and the JEOL 9500FSZ. The mask makers are the Heidelberg DWL2000 laser pattern generator and the Heidelberg DWL66 laser pattern generator.
Large, useful manual available from Help menu
Boolean and derived layer operations; subtract, grow and shrink on groups of objects
Design navigator for easy traversal of design hierarchy
Area calculator (in Tools -> Add-Ins)
Cross-section viewer to simulate a set of simplified process steps and visualize vertical structure of a device
Support for parameterized cells called T-Cells
User-programmable interface (UPI) with C/C++ syntax