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| Sample Holder | Substrate Type | Substrate Thickness | Holder Image | CAD Files |
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DiLL |
- Microscope Slide: 24-26 mm x 50-76 mm
| 2. Fused Silica Substrate, ITO-Coated substrate, Silicon Substrate: 25 x 25 mm² | | 3. Borosilicate Substrate: Ø 30 mm | | 4. Tiny Substrates: 12 mm > Ø 30 mm > 25.4 mm |
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| 1.00 mm | 0.70 mm, 0.70 mm, 0.725 mm | | 0.17 mm | | 0.30 mm |
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 Multi-DiLL
| Fused Silica Substrate, ITO-Coated substrate, Silicon Substrate: 25 x 25 mm² | 0.70 mm, 0.70 mm, 0.725 mm |  | multidill.stl multidill.stp *Note: some dimensions are approximated |
2" Wafer | Ø 2 inch Wafer | 0.35 – 0.55 mm | |
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10 × Ø 30 mm | Ø 30 mm | 0.17 mm | |
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Resins
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Available at the CNF
| - IP-DIP: IP-Dip is a liquid negative-tone 2PP resin formulation by NanoScribe designed for printing the finest possible features. IP-Dip is a component of the 3D SF Solution Set. Tall structures exceeding the working distance of the objective can be printed using the DiLL configuration.
- IP-S: IP-S is a highly viscous liquid negative-tone 2PP resin formulation by NanoScribe designed for printing medium-sized features in DiLL. IP-S combines low shrinkage and high stability with a smooth structural surface finish perfect for micro-optics. The photosensitivity is tailored for two-photon polymerization and UV-curing is also possible. As a component of the 3D MF solution set, IP-S is suitable for printing structures with dimensions of several cubic millimeters.
- IP-L 780: IP-L 780 is a liquid negative-tone 2PP resin formulation designed for printing small features in oil immersion configuration. IP-L 780 combines high resolution with low shrinkage and high stability.
- IP-Q: IP-Q is a highly viscous liquid negative-tone 2PP resin formulation by NanoScribe. The 3D LF Microfabrication Solution Set, including IP-Q, extends 2PP 3D printing towards rapid printing of mesoscale structures with millimeter sizes, micrometer precision, and maximum throughput up to the macroscale.
- SU-8: SU-8 is a UV-curable negative-tone 2PP resin by Kayaku Advanced Materials. This resin is well-known and widely used in the lithography community. [The following article applies only to SU-8 100 determined to be the most suitable resin for 2PP as it balances quality and printing speed.]
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In some cases, sonication in IPA may work to dislodge a part from its substrate, using short durations (<1 min) and checking your part often.
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An example folder is included which demonstrates this printing method. It can be downloaded here: NS_multi_part.zip
The code after the standard header text in the job file is below:
var $centerX = 0
var $centerY = 0
var $i = 0 % Include slicer output
include pedestal_job.gwl % Prints the base part MessageOut "Pedestal printed" %Displays a message in the NanoWrite info window MessageOut "X center:"
ShowVar $centerX %Displays the current set value for X center
MessageOut "Y center:"
ShowVar $centerY %Displays the current set value for Y center MessageOut "Printing statue"
Pause %Waits for user input to continue or abort print for $i = 0 to 1 % This loop prints two sets of 'statues', adding 200um in Z height each time to ensure they print atop the pedestal
StageGotoX $centerX % Ensures the stage moves to a known center. Users can set other values if the subsequent prints should be offset
StageGotoY $centerY
AddZDrivePosition 200
include statue_job.gwl % Make sure the interface finding is OFF in statue_data.gwl as the stage will reset to the interface location otherwise end |
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The folder contains two sliced parts: pedestal.stl via 25X Swift Mode and statue.stl via 25X Balanced Swift Mode. Master_job.gwl contains the commands to first print the pedestal and then two copies of the 'statue' atop. When generating a 3D preview, the final object should look like this:
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