...
Laser-based direct writing has been around for a few years especially in the semiconductor industry known as maskless lithography (MPL). Typically, the two-dimensional CAD design is transferred onto the substrate that is pre-coated with a photosensitive resin via reduction laser projection. The projected pattern was reduced given the tool's numerical aperture and scan across the surface of the substrate using either a raster or vector format. These techniques are the same ones utilized in 3D direct-write. The only difference is that know now you are working with a thickness degree of freedom that can be scanned across the Z-axis. The NanoScribe GT2 has a Piezo Nanopositioning stage and a high-speed galvo scanner. In the case of two-photon lithography, the light source is a pulsed femtosecond fiber laser with the center wavelength being around 780 nm.
...
- Send the tool manager a request for online access to NanoScribe’s NanoGuide Webpage.
- Meet with the tool manager to discuss your project.
- Complete the CULearn training for the tool.
CULearn Training links:
- RSRCH - CNF - NanoScribe GT2 (NetID Link)
- RSRCH - CNF - NanoScribe GT2 (GuestID Link)
- Once you completed the CULearn video and quiz, email the tool manager to schedule a hands-on training session.
- Users are required and responsible for reviewing the services and procedures provided by NanoScribe on the following:
- You will need to log in to NanoGuide to view these materials.
- Model Creation (CAD)and Import
- Printing
- Print with Solution Sets
- Print Applications
- Print Strategies
- Programming Structures
- Post Print Processes
- Further REading
- You will need to log in to NanoGuide to view these materials.
- Check your STL model for common mesh errors. You can use CAD software capable of mesh verification such as Autodesk Meshmixer or MeshLab
- Once your file has been checked for mesh errors, run it through DeScribe to do the conversion. Be sure to select the desired solution set (SF, MF, or LF) for your process.
- Once the CULearn
...