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Multi-DiLL Printing
Multiple print Jobs
DiLL Process Substrates used on the tool
- Fused Silica Substrates
- Borosilicate Substrate
- ITO coated Borosilicate Substrates
- Silicon Substrates
Resins available at the CNF
Material Specifications for standard printing at CNF
Substrates
Resin
- IP-DIP: IP-Dip is a liquid negative-tone 2PP resin formulation by NanoScribe designed for printing the finest possible features. IP-Dip is a component of the 3D SF Solution Set. Tall structures exceeding the working distance of the objective can be printed using the DiLL configuration.
- IP-S: IP-S is a highly viscous liquid negative-tone 2PP resin formulation by NanoScribe designed for printing medium-sized features in DiLL. IP-S combines low shrinkage and high stability with a smooth structural surface finish perfect for micro-optics. The photosensitivity is tailored for two-photon polymerization and UV-curing is also possible. As a component of the 3D MF solution set, IP-S is suitable for printing structures with dimensions of several cubic millimeters.
- IP-L 780: IP-L 780 is a liquid negative-tone 2PP resin formulation designed for printing small features in oil immersion configuration. IP-L 780 combines high resolution with low shrinkage and high stability.
- IP-Q: IP-Q is a highly viscous liquid negative-tone 2PP resin formulation by NanoScribe. The 3D LF Microfabrication Solution Set, including IP-Q, extends 2PP 3D printing towards rapid printing of mesoscale structures with millimeter sizes, micrometer precision, and maximum throughput up to the macroscale.
- SU-8: SU-8 is a UV-curable negative-tone 2PP resin by Kayaku Advanced Materials. This resin is well-known and widely used in the lithography community. [The following article applies only to SU-8 100 determined to be the most suitable resin for 2PP as it balances quality and printing speed.]
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Developer
DiLL Process Substrates used on the tool
- Fused Silica Substrates
- Borosilicate Substrate
- ITO coated Borosilicate Substrates
- Silicon Substrates
Resins available at the CNF
Metrology & Post Processing
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